Title
Optimization of ferroelectric tunnel junction TFET in presence of temperature and its RF analysis.
Abstract
This paper proposes a device incorporating ferroelectric tunnel junction which analyzes the concept of tunneling across a silicon doped hafnium oxide ferroelectric. Variation of electrical parameters with ferroelectric thickness has been examined. Subthreshold swing (SS) of 40 mV/dec has been achieved with ferroelectric thickness of 2 nm. An increasing trend in the ION/IOFF ratio is observed with the increase in ferroelectric thickness. Moreover, the impact of temperature (300 K–500 K) on drain current as well as various RF parameter performance such as gate capacitance (CGG), transconductance (gm), output conductance (gd), intrinsic delay, intrinsic gain (gm/gd), cut off frequency (ft) and transconductance frequency product (TFP) has been studied.
Year
DOI
Venue
2019
10.1016/j.mejo.2019.104618
Microelectronics Journal
Keywords
Field
DocType
FTJ,SS,TFP,TER,TFET
Quantum tunnelling,Ferroelectricity,Doping,Tunnel junction,Engineering,Transconductance,Cutoff frequency,Conductance,Condensed matter physics,Silicon
Journal
Volume
ISSN
Citations 
92
0026-2692
0
PageRank 
References 
Authors
0.34
0
3
Name
Order
Citations
PageRank
Ghosh Puja100.34
Rupam Goswami200.68
Brinda Bhowmick302.03