Title
Microtransfer-Printed InGaAs/InP HBTs Utilizing a Vertical Metal Sub-Collector Contact
Abstract
InGaAs/InP heterojunction bipolar transistors (HBTs) have enabled record results in RF, mm-wave, and high-speed mixed signal circuit designs, due to their simultaneously high ft and fmax cutoff frequencies [1]. For millimeter-wave power amplification, InP HBTs offer wide fractional bandwidths and high efficiencies compared to GaN HEMT technologies, while typically operating at lower power densities (1-2 W/mm normalized to emitter length) and output power levels . To increase the RF power density of InP HBTs, we wish to increase the utilization of the active device area in a fixed footprint, while managing device self-heating. Decoupling the HBT from the InP substrate allows for reduced device thermal resistance by removing high thermal resistivity ternary materials, and the InP substrate itself [2], [3]. Microtransfer printing (MTP) enables devices to be removed from their native substrate, and placed accurately (~1 micron placement error) on another surface [4]. Here, we report results on microtransfer printed InP HBTs placed directly on a metallic sub-collector ohmic contact deposited on a high-thermal conductivity SiC substrate. The HBTs utilize a fine-pitch array of emitter fingers on a single base-collector mesa to increase the HBT active-area utilization while maintaining RF performance. Load-pull measurements at 30 GHz show a increase in RF power density compared to conventional mesa-HBTs with a similar device footprint.
Year
DOI
Venue
2019
10.1109/DRC46940.2019.9046426
2019 Device Research Conference (DRC)
Keywords
DocType
ISSN
metallic sub-collector ohmic contact,microtransfer printing,high thermal resistivity ternary materials,reduced device thermal resistance,InP substrate,device self-heating,active device area,millimeter-wave power amplification,high-speed mixed signal circuit designs,vertical metal sub-collector contact,mesa-HBTs,RF power density,HBT active-area utilization,HBTs utilize,high-thermal conductivity SiC substrate,frequency 30.0 GHz,SiC,InGaAs-InP
Conference
1548-3770
ISBN
Citations 
PageRank 
978-1-7281-2113-0
0
0.34
References 
Authors
1
5
Name
Order
Citations
PageRank
Andy D Carter101.01
M. Urteaga2167.43
Petra Rowell300.34
Joshua Bergman400.34
Andrea Arias500.34