Title
Defect characterization of InAs/InGaAs quantum dot photodetector grown on GaAs-on-V-grooved-Si substrate
Abstract
Recently, monolithic integration of III-IV quantum dots (QDs) on Si substrate has attracted much interest due to its potential to integrate photodetectors and lasers in silicon (Si) photonics [1], [2]. However, the device performance is often limited by the defects induced by the lattice mismatch between III-V materials and Si substrate. In this work, we report results of defect characterization on an InAs QD p-i-n photodetector epitaxially grown on Silicon. The device shows a very low dark current and low frequency noise spectroscopy (LFNS) characterizations were carried out to identify and quantify the deep level within the devices.
Year
DOI
Venue
2019
10.1109/DRC46940.2019.9046450
2019 Device Research Conference (DRC)
Keywords
DocType
Volume
deep level quantification,low frequency noise spectroscopy characterizations,dark current,silicon substrates,InAs quantum dots p-i-n photodetector,III-IV quantum dots,monolithic integration,GaAs-on-V-grooved-silicon substrate,defect characterization,III-V materials,lattice mismatch,silicon photonics,InAs-InGaAs
Conference
6
Issue
ISSN
ISBN
5
1548-3770
978-1-7281-2113-0
Citations 
PageRank 
References 
0
0.34
0
Authors
10
Name
Order
Citations
PageRank
Jian Huang1114.34
Yating Wan200.34
Daehwan Jung301.69
Justin Norman400.34
Chen Shang500.34
Qiang Li601.01
Kei May Lau733.54
Arthur Gossard801.35
John E. Bowers920034.42
Baile Chen1000.34