Name
Title | ||
|---|---|---|
A two-phase non-dominated sorting particle swarm optimization for chip feature design to improve wafer exposure effectiveness |
Abstract | ||
|---|---|---|
•A two-phase non-dominated sorting particle swarm optimization (TNSPSO) is proposed.•Maximizing gross die number and minimizing shot number are performed simultaneously.•Alternative chip features are provided to enhance wafer exposure effectiveness.•An empirical study was conducted from a semiconductor company. |
Year | DOI | Venue |
|---|---|---|
2020 | 10.1016/j.cie.2020.106669 | Computers & Industrial Engineering |
Keywords | DocType | Volume |
Chip feature design,Particle swarm optimization,Wafer exposure,Multi-objective,Pareto-optimal,Semiconductor manufacturing | Journal | 147 |
ISSN | Citations | PageRank |
0360-8352 | 0 | 0.34 |
References | Authors | |
0 | 2 | |
Name | Order | Citations | PageRank |
|---|---|---|---|
| Chia-Yu Hsu | 1 | 11 | 2.96 |
| Shih-Chang Chiu | 2 | 0 | 0.34 |