Paper Info
Title
Monte Carlo Analysis of Measurement Uncertainties for On-Wafer Multiline TRL Calibration Including Dynamic Accuracy
Abstract
The multiline thru-reflect-line (TRL) calibration algorithm model is used to determine the error sources and uncertainties for on-wafer S-parameter measurements, and the uncertainty source is presented in a diagrammatic form. The quantitative contribution of each input error source to the S-parameter of the device under test (DUT) is obtained through the Monte Carlo method. Through analysis, it is found that the dynamic accuracy of the vector receiver as an ignored source of uncertainty makes a significant contribution to the amplitude of transmission coefficients and large reflection coefficient of the on-wafer S-parameters. Finally, the influence of dynamic accuracy measurement error on the DUT with different reflection coefficients is studied.
Year
DOI
Venue
2020
10.1109/TIM.2020.2995970
IEEE Transactions on Instrumentation and Measurement
Keywords
DocType
Volume
Batteries,Predictive models,Degradation,Estimation,Reliability,Data models,Mathematical model
Journal
69
Issue
ISSN
Citations 
11
0018-9456
0
PageRank 
References 
Authors
0.34
0
7
Name
Order
Citations
PageRank
Peng Luan100.68
Yibang Wang200.68
Wei Zhao394.55
Chen Liu400.68
Faguo Liang500.68
Aihua Wu600.68
Jing Du700.34