Name
Title | ||
|---|---|---|
Development and Characterization of High Temperature Plasma Nitridation Process for Advanced CMOS Technology Application. |
Year | DOI | Venue |
|---|---|---|
2021 | 10.1109/ASICON52560.2021.9620365 | ASICON |
DocType | Citations | PageRank |
Conference | 0 | 0.34 |
References | Authors | |
0 | 11 | |
Name | Order | Citations | PageRank |
|---|---|---|---|
| Xiaoxu Kang | 1 | 0 | 1.35 |
| Xiaolan Zhong | 2 | 0 | 1.35 |
| Zhangfa Chen | 3 | 0 | 0.34 |
| Zhengkai Dao | 4 | 0 | 0.34 |
| Qiang Zhang | 5 | 88 | 20.16 |
| Hao Wan | 6 | 4 | 2.14 |
| Yamin Zhou | 7 | 0 | 0.68 |
| Ming Li | 8 | 5595 | 829.00 |
| Yingjia Guo | 9 | 0 | 0.34 |
| Ran Nie | 10 | 0 | 0.34 |
| Tao Wu | 11 | 21 | 7.71 |