Name
Title | ||
|---|---|---|
GHz C-V Characterization Methodology and Its Application for Understanding Polarization Behaviors in High-k Dielectric Films |
Abstract | ||
|---|---|---|
In this study, we report an ultra-fast C-V (>4 GHz) measurement methodology for characterizing the high-frequency polarization phenomena in high-k dielectric films (HfO2 and Al2O3). It is confirmed that the methodology based on the displacement current measurement could be applied for GHz CV measurements of high-k dielectric films. Both HfO2 and Al<in... |
Year | DOI | Venue |
|---|---|---|
2022 | 10.1109/IRPS48227.2022.9764436 | 2022 IEEE International Reliability Physics Symposium (IRPS) |
Keywords | DocType | ISBN |
Polarization,Permittivity measurement,Current measurement,Capacitance-voltage characteristics,Dielectric films,Hafnium compounds,High-k dielectric materials | Conference | 978-1-6654-7950-9 |
Citations | PageRank | References |
0 | 0.34 | 0 |
Authors | ||
5 | ||