Author Info
Name
Affiliation
Papers
JEFFREY D. GELORME
IBM Research Division, Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598, USA
1
Collaborators
Citations 
PageRank 
4
5
4.72
Referers 
Referees 
References 
19
32
5
Title
Citations
PageRank
Year
Negative photoresists for optical lithography54.721997