Name
Abstract | ||
|---|---|---|
Negative photoresists are materials that become insoluble in developing solutions when exposed to optical radiation. They were the first systems used to pattern semiconductor devices, and still comprise the largest segment of the photoresist industry because they are widely used to define the circuitry in printed wiring boards. However, the current use of negative resists in the semiconductor indu... |
Year | DOI | Venue |
|---|---|---|
1997 | 10.1147/rd.411.0081 | IBM Journal of Research and Development |
Keywords | Field | DocType |
optical lithography,negative photoresists | Nanotechnology,IBM,Surface micromachining,Computer science,Photolithography,Electronic engineering,Resist,Photoresist,Lithography,Semiconductor device,Integrated circuit | Journal |
Volume | Issue | ISSN |
41 | 1-2 | 0018-8646 |
Citations | PageRank | References |
5 | 4.72 | 5 |
Authors | ||
5 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Jane M. Shaw | 1 | 9 | 6.71 |
| Jeffrey D. Gelorme | 2 | 5 | 4.72 |
| Nancy C. LaBianca | 3 | 5 | 4.72 |
| Will E. Conley | 4 | 5 | 4.72 |
| Steven J. Holmes | 5 | 7 | 6.51 |