Author Info
Name
Affiliation
Papers
S. BRUYERE
STMicroelectronics, Central R&D labs, 850 rue Jean Monnet, BP16, 38926 Crolles, France
2
Collaborators
Citations 
PageRank 
6
3
2.06
Referers 
Referees 
References 
10
0
0
Title
Citations
PageRank
Year
Series resistance and oxide thickness spread influence on Weibull breakdown distribution: New experimental correction for reliability projection improvement00.342002
Determination of Dielectric Breakdown Weibull Distribution Parameters Confidence Bounds for Accurate Ultrathin Oxide Reliability Predictions31.722001