Author Info
Name
Affiliation
Papers
K.L. PEY
Microelectronics Center, Nanyang Technological University, Nanyang Avenue, 639798 Singapore
3
Collaborators
Citations 
PageRank 
9
4
1.87
Referers 
Referees 
References 
11
3
1
Title
Citations
PageRank
Year
Structure of the oxide damage under progressive breakdown10.522005
Correlation of failure mechanism of constant-current-stress and constant-voltage-stress breakdowns in ultrathin gate oxides of nMOSFETs by TEM10.632003
Physical analysis of hard and soft breakdown failures in ultrathin gate oxides20.732002