Author Info
Name
Affiliation
Papers
L.J. TANG
Microelectronics Center, Nanyang Technological University, Nanyang Avenue, 639798 Singapore
3
Collaborators
Citations 
PageRank 
17
2
1.49
Referers 
Referees 
References 
7
0
0
Title
Citations
PageRank
Year
Structure of the oxide damage under progressive breakdown10.522005
Impact of barrier deposition process on electrical and reliability performance of Cu/CVD low k SiOCH metallization00.342004
Correlation of failure mechanism of constant-current-stress and constant-voltage-stress breakdowns in ultrathin gate oxides of nMOSFETs by TEM10.632003