Author Info
Name
Affiliation
Papers
JÖRG SCHULZE
Institute of Semiconductor Engineering (IHT), University of Stuttgart, Stuttgart, Germany
3
Collaborators
Citations 
PageRank 
10
1
1.30
Referers 
Referees 
References 
3
0
0
Title
Citations
PageRank
Year
Electrical Characterization of Low-Temperature Boron on Silicon Deposition utilizing Molecular Beam Epitaxy10.632019
Electrical Characterization of pure Boron-on-Germanium pin Diodes00.342019
Back-end-of-line CMOS-compatible diode fabrication with pure boron deposition down to 50 °C00.342019