Author Info
Name
Affiliation
Papers
ZHANGLI LIU
Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
3
Collaborators
Citations 
PageRank 
7
3
1.42
Referers 
Referees 
References 
21
22
5
Title
Citations
PageRank
Year
Radiation-induced shallow trench isolation leakage in 180-nm flash memory technology.10.482012
The impact of total ionizing radiation on body effect00.342011
Total ionizing dose effects in elementary devices for 180-nm flash technologies20.602011