Author Info
Name
Affiliation
Papers
M. KOIKE
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 1, Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
1
Collaborators
Citations 
PageRank 
9
0
0.34
Referers 
Referees 
References 
0
9
1
Title
Citations
PageRank
Year
Comprehensive 2D-carrier profiling of low-doping region by high-sensitivity scanning spreading resistance microscopy (SSRM) for power device applications00.342015