Title | ||
---|---|---|
Failure analysis and detection methodology for capacitive RF-MEMS switches based on BEOL BiCMOS process. |
Abstract | ||
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•Failure investigation methodology dedicated to RF-MEMS switches on 250nm BEOL CMOS.•The focus is devoted to the effects technology dispersions on stress induced deformations.•The failure analysis by coupling a optical profilometer to accurate electrical model.•Real time monitoring of the device functional behavior and early failure detection.•The study based on failure criteria coming from industrial space applications. |
Year | DOI | Venue |
---|---|---|
2013 | 10.1016/j.microrel.2013.07.099 | Microelectronics Reliability |
Field | DocType | Volume |
BiCMOS,Coupling,Compatibility (mechanics),Microelectromechanical systems,Capacitive sensing,Electronic engineering,Profilometer,Engineering,Bicmos process,Equivalent circuit | Journal | 53 |
Issue | ISSN | Citations |
9 | 0026-2714 | 0 |
PageRank | References | Authors |
0.34 | 1 | 6 |
Name | Order | Citations | PageRank |
---|---|---|---|
N. Torres Matabosch | 1 | 1 | 0.96 |
F. Coccetti | 2 | 40 | 11.42 |
M. Kaynak | 3 | 11 | 5.84 |
B. Espana | 4 | 0 | 0.34 |
Bernd Tillack | 5 | 10 | 3.01 |
J. L. Cazaux | 6 | 0 | 0.34 |