Title
A 3.3-V, 4-Mb nonvolatile ferroelectric RAM with selectively driven double-pulsed plate read/write-back scheme
Abstract
This paper presents, for the first time, a 4-Mb ferroelectric random access memory, which has been designed and fabricated with 0.6-/spl mu/m ferroelectric storage cell integrated CMOS technology. In order to achieve a stable cell operation, novel design techniques robust to unstable cell capacitors are proposed: (1) double-pulsed plate read/write-back scheme; (2) complementary data preset referen...
Year
DOI
Venue
2000
10.1109/4.841494
IEEE Journal of Solid-State Circuits
Keywords
DocType
Volume
Random access memory,Ferroelectric films,Nonvolatile memory,Ferroelectric materials,CMOS technology,Integrated circuit technology,Robustness,Capacitors,Fatigue,Voltage
Journal
35
Issue
ISSN
Citations 
5
0018-9200
4
PageRank 
References 
Authors
1.80
2
3
Name
Order
Citations
PageRank
Yeonbae Chung1184.66
Byung-Gil Jeon2225.40
Kang-Deog Suh35622.19