Title
Electrical analysis of DRAM cell transistors for the root-cause addressing of the tRDL time-delay failure
Abstract
Electrical analysis of the DRAM cell transistors to find the root cause of the t(RDL) time-delay failure was carried out. The t(RDL) failure which is a critical yield-determining failure mode of scaled DRAMs was found to be caused by the high lightly doped drain (LDD) resistance of the cell transistors. A new forward biased drain current measurement with gate turn-on, charge pumping technique, and impact ionization induced substrate current measurement were used to trace the dominant resistance cause for the t(RDL) failure, and their analysis results were discussed. (C) 2003 Elsevier Ltd. All rights reserved.
Year
DOI
Venue
2003
10.1016/S0026-2714(03)00259-2
Microelectronics Reliability
Field
DocType
Volume
Dram,Electrical analysis,Electronic engineering,Engineering,Transistor,Root cause,Electrical engineering,Reliability engineering
Journal
43
Issue
ISSN
Citations 
9
0026-2714
0
PageRank 
References 
Authors
0.34
0
4
Name
Order
Citations
PageRank
Young Pil Kim100.68
Uin Chung210.78
Joo Tae Moon300.68
Sang U. Kim400.68