Title
Electromigration behavior in Cu/Sn–8Zn–3Bi/Cu solder joint
Abstract
Electromigration behavior in a one-dimensional Cu/Sn–8Zn–3Bi/Cu solder joint structure was investigated in ambient with a current density of 3.5×104 A/cm2 at 60°C. Due to the compressive stress induced by volume expansion resulting from Cu–Zn intermetallic compound (IMC) growth, Cu5Zn8 IMC layers were squeezed out continuously along IMC/Cu interfaces at both the anode and the cathode with increasing the current stressing time, which was not only driven by the concentration gradient, but also accelerated by the electromigration. And a few voids propagated and formed at the anode and the cathode solder/IMC interfaces during electromigration. Additionally, Sn hillocks occurred in the bulk solder, and Sn hillocks formed at the anode side were larger than those at the cathode side.
Year
DOI
Venue
2010
10.1016/j.microrel.2009.09.018
Microelectronics Reliability
Keywords
Field
DocType
current density,intermetallic compound,electromigration
Current density,Intermetallic,Anode,Soldering,Metallurgy,Engineering,Void (astronomy),Electromigration,Cathode,Hillock
Journal
Volume
Issue
ISSN
50
2
0026-2714
Citations 
PageRank 
References 
0
0.34
0
Authors
5
Name
Order
Citations
PageRank
Lijuan Liu100.68
Wei Zhou200.34
Hongbo Zhang3145.68
Baoling Li481.34
Ping Wu500.68