Paper Info
Title
Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate
Abstract
This paper describes the fabrication processes of a new type of metal-embedded photo-mask, which will be used in standard photolithography and for fabricating patterned sapphire substrates. This new metal-embedded photo-mask is prepared by metal contact printing lithography and therefore can easily achieve smaller feature size around or below 1 μm. Besides its easiness in fabricating and obtaining smaller line-width, this new metal-embedded photo-mask differs from a conventional Cr/glass photo-mask in that the metallic patterns are embedded and therefore are not in contact with photo-resist during UV exposure. This unique feature can minimize the damage to photo-mask in use and prolong its lifetime. In this work, this metal-embedded photo-mask is experimentally prepared and applied to photolithographic patterning of PR microstructures on sapphire substrates, which are important in LED industries.
Year
DOI
Venue
2012
10.1109/NEMS.2012.6196717
NEMS
Keywords
Field
DocType
ultraviolet radiation effects,patterned sapphire substrates,metal contact printing lithography,metal-embedded photo-mask,led industries,photoresist,masks,metal embedded photomask fabrication,uv exposure,submicrometer scaled photolithography,patterned sapphire substrate,photoresists,metals,microstructures,optical imaging,stimulated emission
Nanotechnology,Contact print,Photomask,Photolithography,Photoresist,Lithography,Sapphire,Micrometer,Materials science,Optoelectronics,Fabrication
Conference
ISBN
Citations 
PageRank 
978-1-4673-1122-9
0
0.34
References 
Authors
0
2
Name
Order
Citations
PageRank
Jhih-Nan Yan100.34
Yung-Chun Lee255.73