Title
A new technique for IDDQ testing in nanometer technologies
Abstract
IDDQ testing has become a widely accepted defect detection technique in CMOS ICs. However, its effectiveness in very deep submicron technologies is threatened by the increased transistor leakage current. In this paper, we propose a technique for the elimination, during testing, of the normal leakage current from the sensing node of a circuit under test. In this way the already known in the open literature IDDQ sensing techniques can be applied in the nanometer technologies.
Year
DOI
Venue
2002
10.1016/S0167-9260(02)00023-8
Integration
Keywords
Field
DocType
IDDQ testing,Current monitoring,Design for testability
Design for testing,Leakage (electronics),Computer science,CMOS,Electronic engineering,Iddq testing,Nanometre,Transistor,Electrical engineering,Circuit under test
Journal
Volume
Issue
ISSN
31
2
0167-9260
Citations 
PageRank 
References 
0
0.34
11
Authors
5
Name
Order
Citations
PageRank
Y. Tsiatouhas16811.07
Y. Moisiadis216.27
Th. Haniotakis3437.74
D. Nikolos429131.38
A. Arapoyanni53911.46