Title
Defect cluster recognition system for fabricated semiconductor wafers
Abstract
The International Technology Roadmap for Semiconductors (ITRS) identifies production test data as an essential element in improving design and technology in the manufacturing process feedback loop. One of the observations made from the high-volume production test data is that dies that fail due to a systematic failure have a tendency to form certain unique patterns that manifest as defect clusters at the wafer level. Identifying and categorising such clusters is a crucial step towards manufacturing yield improvement and implementation of real-time statistical process control. Addressing the semiconductor industry's needs, this research proposes an automatic defect cluster recognition system for semiconductor wafers that achieves up to 95% accuracy (depending on the product type).
Year
DOI
Venue
2013
10.1016/j.engappai.2012.03.016
Eng. Appl. of AI
Keywords
Field
DocType
semiconductor wafer,real-time statistical process control,defect cluster,defect cluster recognition system,production test data,certain unique pattern,automatic defect cluster recognition,manufacturing process feedback loop,high-volume production test data,international technology roadmap,semiconductor industry,feature extraction
Cluster (physics),Wafer,Computer science,Feedback loop,International Technology Roadmap for Semiconductors,Die (manufacturing),Artificial intelligence,Test data,Statistical process control,Reliability engineering,Machine learning,Semiconductor
Journal
Volume
Issue
ISSN
26
3
0952-1976
Citations 
PageRank 
References 
7
0.57
16
Authors
5
Name
Order
Citations
PageRank
Melanie Po-Leen Ooi17018.35
Hong Kuan Sok2151.80
Ye Chow Kuang37219.81
Serge Demidenko4477.78
Chris Chan570.57