Title
Contactless electroreflectance study of band bending for undoped, Si- and Mg-doped GaN layers and AlGaN/GaN transistor heterostructures
Abstract
The surface band bending in undoped, Si-doped and Mg-doped GaN layers with Ga-face polarity as well as AlGaN/GaN heterostructures with Ga(Al)-face polarity has been investigated by room temperature contactless electroreflectance (CER) spectroscopy. The opposite phase of CER resonance (i.e., opposite band bendings) has been observed for n-type (undoped and Si-doped) and p-type (Mg-doped) GaN layers. It means that for thick GaN layers the surface band bending results not from crystal polarity but from the Fermi-level pinning at the surface and carrier type/concentration inside the layer. The crystal polarity can influence the surface band bending for thin (Al)GaN layers for which the screening phenomena can be neglected or are very weak. Such a situation is typical of AlGaN/GaN transistor structures where the thickness of AlGaN layer is below 40nm. In this case, the strong internal electric field in AlGaN layer is manifested in CER spectra by a resonance with a long period Franz-Keldysh oscillation.
Year
DOI
Venue
2009
10.1016/j.mejo.2008.07.028
Microelectronics Journal
Keywords
Field
DocType
gan,gan transistor structure,band bending,contactless electroreflectance,gan heterostructures,ga-face polarity,surface band,algan layer,gan transistor heterostructures,crystal polarity,thick gan layer,fermi level,gan layer,mg-doped gan layer,contactless electroreflectance study,face polarity,room temperature,oscillations,electric field
Extrinsic semiconductor,Franz–Keldysh effect,Doping,Electronic engineering,Band bending,Thin film,Engineering,Heterojunction,Semiconductor,Condensed matter physics,Fermi level
Journal
Volume
Issue
ISSN
40
2
Microelectronics Journal
Citations 
PageRank 
References 
0
0.34
0
Authors
6
Name
Order
Citations
PageRank
R. Kudrawiec112.85
M. Motyka201.01
J. Misiewicz312.85
B. Paszkiewicz401.01
R. Paszkiewicz500.68
M. Tlaczala601.69