Name
Abstract | ||
|---|---|---|
The authors discuss statistical intervals and provide an application of tolerance intervals to parametric characterization of semiconductor devices during the development cycle. Specifically, a methodology for computing two-sided tolerance intervals for a one-way random-effects model from a normal population is presented. The proposed approach is relevant to any industry in which batch processing exists |
Year | DOI | Venue |
|---|---|---|
1990 | 10.1109/TEST.1990.114136 | Washington, DC |
Keywords | Field | DocType |
batch processing (industrial),random processes,semiconductor device manufacture,semiconductor device testing,statistical analysis,batch processing,development cycle,normal population,one-way random-effects model,parametric characterization,semiconductor devices,statistical intervals,two-sided tolerance intervals | Population,Computer science,Stochastic process,Electronic engineering,Parametric statistics,Batch processing,Tolerance interval,Semiconductor device,Statistical analysis | Conference |
Citations | PageRank | References |
0 | 0.34 | 0 |
Authors | ||
2 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Yolanda T. Hadeed | 1 | 0 | 0.34 |
| Kevin T. Lewis | 2 | 0 | 0.34 |