Title
Superior performance and Hot Carrier reliability of Strained FDSOI nMOSFETs for advanced CMOS technology nodes
Abstract
The Hot Carrier (HC) reliability of NMOS transistors fabricated on biaxially tensile-strain SOI substrates (sSOI) is compared to that of devices fabricated on standard unstrained SOI substrates. It is shown that sSOI-based devices not only exhibit a 10% higher performance in term of ION/IOFF but also show superior HC reliability at same drive current. This reliability improvement may be explained by a better interface quality for sSOI films.
Year
DOI
Venue
2014
10.1109/ESSDERC.2014.6948801
Solid State Device Research Conference
Keywords
Field
DocType
CMOS integrated circuits,MOSFET,hot carriers,semiconductor device reliability,silicon-on-insulator,HC reliability,NMOS transistors,advanced CMOS technology nodes,biaxially tensile-strain SOI substrates,drive current,hot carrier reliability,interface quality,sSOI-based devices,standard unstrained SOI substrates,strained FDSOI nMOSFETs,FDSOI,Hot Carrier,nMOSFET,reliability,sSOI,strained silicon
Silicon on insulator,Strained silicon,NMOS logic,Chemistry,CMOS,Electronic engineering,Hot carrier reliability,Transistor
Conference
Volume
ISSN
ISBN
113
1930-8876
978-1-4799-4378-4
Citations 
PageRank 
References 
0
0.34
0
Authors
11
Name
Order
Citations
PageRank
Besnard, G.100.34
X. Garros273.00
Andrieu, F.301.01
Nguyen, P.400.34
W. Van Den Daele500.34
P. Reynaud600.34
W. Schwarzenbach700.34
D. Delprat800.34
K. K. Bourdelle900.34
G. Reimbold1000.34
S. Cristoloveanu1100.34