Name
Year | DOI | Venue |
|---|---|---|
2011 | 10.1109/ASICON.2011.6157238 | ASICON |
Keywords | Field | DocType |
sensitivity,ph,etching,oxidation,annealing | Etching,Hydrogen,Field-effect transistor,Computer science,Electronic engineering,Annealing (metallurgy),Membrane,Nanocrystal,Optoelectronics,Ion,Nernst equation | Conference |
Citations | PageRank | References |
0 | 0.34 | 0 |
Authors | ||
3 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Chao-Sung Lai | 1 | 6 | 7.19 |
| Tseng-Fu Lu | 2 | 0 | 0.68 |
| Jer-Chyi Wang | 3 | 1 | 3.07 |