Abstract | ||
---|---|---|
As wafer circuit widths shrink down, wafer fabrication processes require stringent quality control. Therefore, fabs recently tend to clean a chamber after processing each wafer, in order to remove chemical residuals within the chamber. Such chamber cleaning, called purge operation, increases scheduling complexity in robotized cluster tools. In this paper, we examine scheduling problems of single-a... |
Year | DOI | Venue |
---|---|---|
2018 | 10.1109/TASE.2017.2682271 | IEEE Transactions on Automation Science and Engineering |
Keywords | Field | DocType |
Cleaning,Robots,Loading,Job shop scheduling,Chemicals,Chemical vapor deposition,Load modeling | Wafer,Residual,Job shop scheduling,Computer science,Scheduling (computing),Load modeling,Control engineering,Real-time computing,Process control,Throughput,Robot,Embedded system | Journal |
Volume | Issue | ISSN |
15 | 2 | 1545-5955 |
Citations | PageRank | References |
2 | 0.36 | 0 |
Authors | ||
3 |
Name | Order | Citations | PageRank |
---|---|---|---|
Tae-Sun Yu | 1 | 11 | 3.85 |
Hyun-Jung Kim | 2 | 24 | 2.09 |
Tae-Eog Lee | 3 | 285 | 30.02 |