Title
Nanopores created using an internal shadowmask process
Abstract
We report on the manufacturing of nanopore through-holes by heating gold nanoparticles on a silicon oxide (SiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> ) sheet, suspended in a silicon-rich nitride membrane (SiRN). Membrane patterning is performed using self-alignment by an internal shadow mask based process. A benefit of this approach is the ease at which downscaling of the lithographic features can be achieved. With a single alignment, a shadow mask is etched and metal is deposited. The nanopore through hole is then created after heating. In this paper this scalable technique is applied to create non-buckled membranes by combining the compressive and tensile stress components in a SiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> /SiRN bilayer. Theory on the bilayer stresses is given in order to characterize the buckling. The nanopore through holes are characterized using ionic current measurements and electron microscopy techniques.
Year
DOI
Venue
2016
10.1109/NEMS.2016.7758204
2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)
Keywords
DocType
ISSN
solid-state nanopore formation,gold nanoparticles,silicon oxide,silicon rich nitride,shadow mask
Conference
2474-3747
ISBN
Citations 
PageRank 
978-1-5090-1948-9
0
0.34
References 
Authors
0
7