Title
Modeling the Effect of Random Dopants on Hot-Carrier Degradation in FinFETs
Abstract
We present the first physics-based approach to modeling the effect of random dopants on hot-carrier degradation (HCD) in FinFETs, which is based on a statistical analysis of HCD performed over an ensemble of 200 transistors with different random dopant configurations. As a reference, the results obtained with the deterministic version of our HCD model are used. The statistical analysis shows that degradation traces and device lifetimes have quite broad distributions and that the deterministic model tends to overestimate HCD and makes pessimistic predictions on device lifetime. Moreover, lifetime distributions evaluated for high stress voltages and for biases close to the operating regimes have different shapes which makes backward lifetime extrapolation challenging, thereby demonstrating that full physics-based HCD treatment is of crucial importance.
Year
DOI
Venue
2019
10.1109/IRPS.2019.8720584
2019 IEEE International Reliability Physics Symposium (IRPS)
Keywords
Field
DocType
hot-carrier degradation,stochastic modeling,random dopants,physics-based model,FinFET,interface traps
Hot carrier degradation,Analytical chemistry,Dopant,Engineering,Optoelectronics
Conference
ISSN
ISBN
Citations 
1541-7026
978-1-5386-9504-3
0
PageRank 
References 
Authors
0.34
0
11
Name
Order
Citations
PageRank
A. Makarov1103.16
B. Kaczer29221.75
ph j roussel3143.49
adrian chasin4104.90
A. Grill501.01
M. Vandemaele600.34
geert hellings734.22
A.-M. El-Sayed891.69
T. Grasser92110.90
Dimitri Linten102913.72
Stanislav Tyaginov1136.69