Title
Reliability and Performance Issues in SiC MOSFETs: Insight Provided by Spin Dependent Recombination
Abstract
In this work, we utilize electrically detected magnetic resonance via the bipolar amplification effect to explore the physical and chemical nature of defects at the 4H-SiC/SiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> interface in metal-oxide-semiconductor field effect transistors. Defects at and very near the 4H-SiC/SiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> interface are involved in bias temperature instabilities in 4H-SiC transistor technology. Of particular relevance to reliability physics, our results indicate that oxygen deficient silicon atoms in the near-interface oxide, known as E’ centers, can be greatly reduced utilizing nitric oxide and barium annealing. E’ centers have been directly linked to bias temperature instabilities in 4H-SiC technology.
Year
DOI
Venue
2019
10.1109/IRPS.2019.8720423
2019 IEEE International Reliability Physics Symposium (IRPS)
Keywords
Field
DocType
MOSFETs,EDMR,Reliability,SiC,BAE
Engineering physics,Spin-½,Recombination,Electronic engineering,Engineering
Conference
ISSN
ISBN
Citations 
1541-7026
978-1-5386-9504-3
0
PageRank 
References 
Authors
0.34
0
5
Name
Order
Citations
PageRank
James P. Ashton100.34
Patrick M. Lenahan211.06
Daniel J. Lichtenwalner301.01
Aivars J. Lelis401.69
Mark A. Anders518517.43