Name
Title | ||
|---|---|---|
Corrigendum to "Scaling equations for the accurate prediction of CMOS device performance from 180 nm to 7 nm" [Integr. VLSI J. 58. (2017) 74-81]. |
Year | DOI | Venue |
|---|---|---|
2019 | 10.1016/j.vlsi.2019.04.006 | Integration |
DocType | Volume | ISSN |
Journal | 67 | 0167-9260 |
Citations | PageRank | References |
0 | 0.34 | 0 |
Authors | ||
2 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Aaron Stillmaker | 1 | 61 | 5.12 |
| Bevan M. Baas | 2 | 295 | 27.78 |