Name
Title | ||
|---|---|---|
From Virtual Characterization to Test-Chips: DFM Analysis Through Pattern Enumeration. |
Abstract | ||
|---|---|---|
As CMOS technology continues to scale down due to advances in lithography, the interaction of neighboring patterns is exacerbated. Every pattern printed on silicon is influenced by its neighbors given a technology-specific interaction range. As transistors and cells shrink to sizes of the same order of the interaction range, pattern dependencies at the 16-nm node (and below) make the prediction of... |
Year | DOI | Venue |
|---|---|---|
2020 | 10.1109/TCAD.2018.2889772 | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems |
Keywords | Field | DocType |
Libraries,Microsoft Windows,Silicon,Layout,Lithography,Shape,Standards | Engineering drawing,Computer science,Enumeration,Electronic engineering,Design for manufacturability | Journal |
Volume | Issue | ISSN |
39 | 2 | 0278-0070 |
Citations | PageRank | References |
0 | 0.34 | 0 |
Authors | ||
4 | ||
Name | Order | Citations | PageRank |
|---|---|---|---|
| Mayler G. A. Martins | 1 | 88 | 10.08 |
| Samuel N. Pagliarini | 2 | 14 | 4.96 |
| Mehmet Meric Isgenc | 3 | 3 | 2.41 |
| Lawrence T. Pileggi | 4 | 9 | 2.71 |