Abstract | ||
---|---|---|
Aggressive technology scaling trends, such as thinner gate oxide without proportional downscaling of supply voltage, aggravate the aging impact and thus necessitate an aging-aware reliability verification and optimization framework during early design stages. In this paper, we propose a novel in-situ sensing strategy based on deploying transition detectors (TDs), for on-chip aging monitoring and resilience. Transformed into the set cover problem and then formulated into maximum satisfiability, the proposed problem of TD/sensor placement can be solved efficiently. Experimental results show that, by introducing at most 2.2% area overhead (for TD/sensor placement), the aging behavior of a target circuit can be effectively monitored, and the correctness of its functionality can be perfectly guaranteed with an average of 77% aging resilience achieved. In other words, with 2.2% area overhead, potential aging-induced timing errors can be detected and then eliminated, while achieving 77% recovery from aging-induced performance degradation.
|
Year | DOI | Venue |
---|---|---|
2020 | 10.1145/3372780.3375556 | ISPD '20: International Symposium on Physical Design
Taipei
Taiwan
September, 2020 |
DocType | ISBN | Citations |
Conference | 978-1-4503-7091-2 | 0 |
PageRank | References | Authors |
0.34 | 0 | 4 |
Name | Order | Citations | PageRank |
---|---|---|---|
Hao-Chun Chang | 1 | 0 | 0.34 |
Li-An Huang | 2 | 0 | 0.34 |
Kai-Chiang Wu | 3 | 113 | 13.98 |
Yu-Guang Chen | 4 | 1 | 2.40 |