Title
A physics-informed Run-to-Run control framework for semiconductor manufacturing.
Abstract
•A new R2R control framework based on Dynamic Bayesian Network is proposed.•Physic-informed DBN is constructed based on equipment sensor data and prior knowledge.•A causal structure enables analyzing the underlying process interactions.•Validation results with the real data confirm the usefulness of the proposed model.
Year
DOI
Venue
2020
10.1016/j.eswa.2020.113424
Expert Systems with Applications
Keywords
DocType
Volume
Advanced Process Control (APC),Chemical-Mechanical Polishing (CMP),Dynamic Bayesian Network (DBN),Fault Detection and Classification (FDC),Physics-informed,Run-to-Run (R2R) control
Journal
155
ISSN
Citations 
PageRank 
0957-4174
0
0.34
References 
Authors
0
5
Name
Order
Citations
PageRank
Wei-Ting Yang111.02
Jakey Blue2145.15
Agnes Roussy310.69
Jacques Pinaton41912.98
Marco S. Reis5136.49