Title
Traps Based Reliability Barrier On Performance And Revealing Early Ageing In Negative Capacitance Fet
Abstract
Trap charges influence the reliability of semiconductor devices, which is an essential measure of performance evaluation especially for high-performance circuits and safety-critical applications. In this paper for the first time, the individual and combined impact of Si-SiO2 interface traps and Ferroelectric (FE) bulk traps on the performance of the Negative Capacitance (NC) FDSOI FET have been investigated. Our investigation shows: 1) The high interface electric field and variation of trap induced polarization causes early aging effect; 2) Performance degradation due to FE bulk traps that change the vertical field distribution through polarization variation in the FE oxide layer of NC-pFDSOI FET; 3) The combined effect of interface traps and the bulk traps predominantly degrades the performance of NC FDSOI FET as compared to the baseline pFDSOI FET. Our results using well-calibrated TCAD models reveal that the reliability barrier due to joint impact of interface traps and bulk traps, limits the low power performance of NCFET.
Year
DOI
Venue
2021
10.1109/IRPS46558.2021.9405185
2021 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS)
Keywords
DocType
ISSN
Bulk traps, ferroelectric, interface traps, negative capacitance, polarization switching
Conference
1541-7026
Citations 
PageRank 
References 
0
0.34
0
Authors
8
Name
Order
Citations
PageRank
Aniket Gupta100.34
Govind Bajpai200.34
Priyanshi Singhal300.34
Navjeet Bagga400.34
Om Prakash5144.52
Shashank Banchhor600.34
Hussam Amrouch725150.22
Nitanshu Chauhan800.34