Title
Modeling and Simulation Study of Electrical Properties of Ge-on-Si Diodes with Nanometer-thin PureGaB Layer
Abstract
Deposition of a nanometer-thin layer-stack of pure gallium and boron (PureGaB) on arsenic (As)-doped epitaxial germanium (Ge) forms a shallow-junction photodiode, reported to have almost ideal I-V characteristics, low saturation current densities, and high responsivity down to 255 nm wavelengths. In this work, different physical mechanisms that could explain the high anode Gummel number in PureGaB...
Year
DOI
Venue
2021
10.23919/MIPRO52101.2021.9597002
2021 44th International Convention on Information, Communication and Electronic Technology (MIPRO)
Keywords
DocType
ISBN
Gallium,Simulation,Germanium,Semiconductor process modeling,Semiconductor diodes,Photodiodes,Junctions
Conference
978-953-233-101-1
Citations 
PageRank 
References 
0
0.34
0
Authors
4
Name
Order
Citations
PageRank
L. Marković100.34
Tihomir Knezevic213.33
Lis K. Nanver312.56
Tomislav Suligoj419.41