Author Info
Name
Affiliation
Papers
MING TIAN
Shanghai Huali Microelectronics Corporation,Shanghai,China
3
Collaborators
Citations 
PageRank 
16
0
1.01
Referers 
Referees 
References 
0
0
0
Title
Citations
PageRank
Year
Variation Analysis Of Interconnect Capacitance And Process Corner In Advanced Cmos Process With Double Patterning Technology00.342019
Physical mechanism of performance adjustment in selective buried oxide n-MOSFETs00.342019
Performance Investigation Of Uniaxially Tensile Stressed Ge N-Finfets Formed On Biaxially Strained Geoi Substrates And Its Impact On Ge Cmos Inverters00.342019