Title
Charging of radiation induced defects in RF MEMS dielectric films
Abstract
The paper investigates the charging of radiation induced defects in Si3N4 and SiO2 dielectric films, which are used in RF-MEMS switches. The radiation has been performed with 5MeV alpha particles. The assessment has been carried out in Metal-Insulator-Metal capacitors with the thermally stimulated depolarization currents and discharge current transient methods. This allowed monitoring the defects introduction as a function of radiation fluence. The defects electrical characteristics that are the activation energy and corresponding depolarization time constant were determined from the evolution of the thermally stimulated current spectra and the transient response of discharge currents at different temperatures.
Year
DOI
Venue
2006
10.1016/j.microrel.2006.07.045
Microelectronics Reliability
Keywords
Field
DocType
activation energy,time constant,transient response
Transient response,Capacitor,Dielectric,Electronic engineering,Depolarization,Engineering,Alpha particle,Time constant,Radiation,Fluence
Journal
Volume
Issue
ISSN
46
9
0026-2714
Citations 
PageRank 
References 
3
1.58
1
Authors
6
Name
Order
Citations
PageRank
M. Exarchos163.15
E. Papandreou2145.74
P. Pons34918.02
M. Lamhamdi42811.09
G.J. Papaioannou5148.35
R. Plana631.58