Title
Kelvin probe microscopy for reliability investigation of RF-MEMS capacitive switches
Abstract
In this work, we investigate the charging and reliability of interlayer dielectric materials that are used in the fabrication process of advanced RF-MEMS switches. In particular, the charge stored on the surface of a dielectric and the dynamic of this charge at nanometric scale are studied. More attention is given to the decay of the deposited charge by a variety of means: (1) surface conduction, (2) surface charge spreading due to self repulsion and (3) charge injection in the bulk of dielectric material. Kelvin force microscopy (KFM) measurements were performed for various injection time and bias voltage. These results suggest a dynamic charge and allow to predict the amount of charge injected into the dielectric.
Year
DOI
Venue
2008
10.1016/j.microrel.2008.07.046
Microelectronics Reliability
Field
DocType
Volume
Microelectromechanical systems,Dielectric,Kelvin probe force microscope,Electronic engineering,Capacitive sensing,Microscopy,Engineering,Fabrication,Surface charge,Biasing
Journal
48
Issue
ISSN
Citations 
8
0026-2714
2
PageRank 
References 
Authors
0.64
2
8
Name
Order
Citations
PageRank
A. Belarni120.64
M. Lamhamdi22811.09
P. Pons34918.02
L. Boudou4176.55
J. Guastavino5176.55
Y. Segui6176.55
G. Papaioannou7358.62
R. Plana820.64